LamCo - Laminar Co-sputter HiTUS®

PQL have also developed a version of our standard HITUS® technology, LamCo (patented in UK), which converts a circular cross-section plasma into a flat planar plasma, suitable for sputtering from mid-range size targets e.g. 300 x 100 mm target.

  • The generated plasma sheet is several times larger than the plasma source.
  • Larger targets enable larger substrates to be used (suitable for the 300 mm wafer market)
  • Enhanced deposition rates
  • Multiple sputter targets can be utilised (co-sputter)


Plasma Source
Plasma Source