Large Area HiTUS® In-line system (ILH550)

Plasma Quest LARGE AREA HiTUS®:

• Load-lock system for rapid throughput
• Holds up to 16″ sq substrates for large area deposition in a single run
• Large area mechanism produces high rate, low stress films
• Fully automatic control saves operator time and cost while eliminating human error
• Modular layout allows 2 substrates to be simultaneously scanned on opposite side of the target
• Modular design allows for future web handling upgrade
• The large area HiTUS® In-line System has all the attributes of the standard Plasma Quest technology described in the key differentiator section.

SPECIFICATIONS:

• Single or dual load lock
• Two buffer stages either side of the process chamber (allowing substrate oscillation).
• Two substrates can pass the targets at the same time ( hence doubling the system throughput)

ORDERING INFORMATION: 

SKU                        DESCRIPTION                                         PRICE

ILH500                    Large area HiTUS In-Line system            POA

Another large area configuration is the cylindrical target version of HiTUS®. Here the remote plasma is directed along the long axis of a cylindrical target, up to 1.5 metres in length.