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You are here: Materials > Titanium Oxides (TiO₂ etc)

Titanium Oxides (TiO₂ etc)

Plasma Quest Ltd can deposit titanium oxides at high rates and at low temperatures (<70°C) using the proprietary HiTUS thin film sputter deposition equipment. 

Thin films of titanium oxides are deposited by reactive sputtering from a metallic target.  By varying the oxygen partial pressure during the deposition process the film stoichiometry can be controlled – ranging from a pure metallic film through to the conductive corrosions resistant sub oxides and the dielectric TiO₂.