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You are here: Materials > Alumina (Al₂O₃)

Alumina (Al₂O₃)

Thin films of alumina (Al₂O₃) have been deposited using the proprietary Plasma Quest Ltd sputter deposition technology. Exceptional deposition rates and optical transmission are achieved by using a highly stable reactive deposition process. All the film characterisation has been corroborated by independent measurements made by customers and collaborators. PQL would welcome the opportunity to coat Alumina on to any customer substrate including glass, silicon wafers and numerous plastics.

Benefits include:

• Very high deposition rate of High quality alumina
• RI very near to bulk properties
• High electrical breakdown capability
• Very low stress films (controlled through process conditions)
• Deposition onto plastic and delicate substrates
• Also low rate deposition
• Waveguide material
• UV stable